Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms.

F. Robin A. Orzati E. Moreno Otte Jakob Homan W. Bachtold Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms. 69-82 2003 7 IEEE Trans. Evolutionary Computation 1 db/journals/tec/tec7.html#RobinOMHB03 http://dx.doi.org/10.1109/TEVC.2002.806166