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@article{DBLP:journals/tcad/ZhouHLL07,
author = {Zai-Fa Zhou and
Qing-An Huang and
Wei-Hua Li and
Wei Lu},
title = {A Novel 3-D Dynamic Cellular Automata Model for Photoresist-Etching
Process Simulation},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {26},
number = {1},
year = {2007},
pages = {100-114},
ee = {http://dx.doi.org/10.1109/TCAD.2006.882510},
bibsource = {DBLP, http://dblp.uni-trier.de}
}
Copyright © 2008-04-08 by Michael Ley (ley@uni-trier.de)