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BibTeX record journals/tcad/YuXGL0AP15
@article{DBLP:journals/tcad/YuXGL0AP15, author = {Bei Yu and Xiaoqing Xu and Jhih{-}Rong Gao and Yibo Lin and Zhuo Li and Charles J. Alpert and David Z. Pan}, title = {Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography}, journal = {{IEEE} Trans. Comput. Aided Des. Integr. Circuits Syst.}, volume = {34}, number = {5}, pages = {726--739}, year = {2015}, url = {https://doi.org/10.1109/TCAD.2015.2401571}, doi = {10.1109/TCAD.2015.2401571}, timestamp = {Thu, 24 Sep 2020 11:27:41 +0200}, biburl = {https://dblp.org/rec/journals/tcad/YuXGL0AP15.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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