BibTeX record journals/tcad/RankW90

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@article{DBLP:journals/tcad/RankW90,
  author       = {Ernst Rank and
                  Ulrich Weinert},
  title        = {A simulation system for diffusive oxidation of silicon: a two-dimensional
                  finite element approach},
  journal      = {{IEEE} Trans. Comput. Aided Des. Integr. Circuits Syst.},
  volume       = {9},
  number       = {5},
  pages        = {543--550},
  year         = {1990},
  url          = {https://doi.org/10.1109/43.55174},
  doi          = {10.1109/43.55174},
  timestamp    = {Thu, 24 Sep 2020 11:27:40 +0200},
  biburl       = {https://dblp.org/rec/journals/tcad/RankW90.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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