@article{DBLP:journals/tcad/HarafujiMNKY93,
author = {Kenji Harafuji and
Akio Misaka and
Noboru Nomura and
Masahiro Kawamoto and
Hirohiko Yamashita},
title = {A novel hierarchical approach for proximity effect correction
in electron beam lithography},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {12},
number = {10},
year = {1993},
pages = {1508-1514},
ee = {http://doi.ieeecomputersociety.org/10.1109/43.256925},
bibsource = {DBLP, http://dblp.uni-trier.de}
}