BibTeX record journals/rcim/LeeLRO19

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@article{DBLP:journals/rcim/LeeLRO19,
  author       = {Changkyu Lee and
                  Jae Woong Lee and
                  Sang Gil Ryu and
                  Je Hoon Oh},
  title        = {Optimum design of a large area, flexure based XY{\texttheta} mask
                  alignment stage for a 12-inch wafer using grey relation analysis},
  journal      = {Robotics Comput. Integr. Manuf.},
  volume       = {58},
  pages        = {109--119},
  year         = {2019},
  url          = {https://doi.org/10.1016/j.rcim.2019.02.005},
  doi          = {10.1016/J.RCIM.2019.02.005},
  timestamp    = {Fri, 06 Aug 2021 15:04:50 +0200},
  biburl       = {https://dblp.org/rec/journals/rcim/LeeLRO19.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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