@article{DBLP:journals/mr/YangCDSWLC02,
author = {Bing-Liang Yang and
N. W. Cheung and
S. Denholm and
J. Shao and
Hei Wong and
P. T. Lai and
Y. C. Cheng},
title = {Ultra-shallow n$^{\mbox{+}}$p junction formed by PH$_{\mbox{3}}$
and AsH$_{\mbox{3}}$ plasma immersion ion implantation},
journal = {Microelectronics Reliability},
volume = {42},
number = {12},
year = {2002},
pages = {1985-1989},
ee = {http://dx.doi.org/10.1016/S0026-2714(02)00099-9},
bibsource = {DBLP, http://dblp.uni-trier.de}
}