BibTeX record journals/mr/WeberSLBLMBBLM05

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@article{DBLP:journals/mr/WeberSLBLMBBLM05,
  author       = {U. Weber and
                  M. Schumacher and
                  J. Lindner and
                  O. Boissi{\`{e}}re and
                  P. Lehnen and
                  S. Miedl and
                  P. K. Baumann and
                  G. Barbar and
                  C. Lohe and
                  T. McEntee},
  title        = {AVD\({}^{\mbox{{\textregistered}}}\) technology for deposition of
                  next generation devices},
  journal      = {Microelectron. Reliab.},
  volume       = {45},
  number       = {5-6},
  pages        = {945--948},
  year         = {2005},
  url          = {https://doi.org/10.1016/j.microrel.2004.11.019},
  doi          = {10.1016/J.MICROREL.2004.11.019},
  timestamp    = {Sat, 22 Feb 2020 19:28:47 +0100},
  biburl       = {https://dblp.org/rec/journals/mr/WeberSLBLMBBLM05.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}