BibTeX record journals/mr/TomitaKYMUTFMI13

• > Home > journals/mr/TomitaKYMUTFMI13

@article{DBLP:journals/mr/TomitaKYMUTFMI13,
  author       = {Ryuji Tomita and
                  Hidehiko Kimura and
                  M. Yasuda and
                  K. Maeda and
                  S. Ueno and
                  T. Tonegawa and
                  T. Fujimoto and
                  M. Moritoki and
                  Hiroshi Iwai},
  title        = {Improvement on sheet resistance uniformity of nickel silicide by optimization
                  of silicidation conditions},
  journal      = {Microelectron. Reliab.},
  volume       = {53},
  number       = {5},
  pages        = {665--669},
  year         = {2013},
  url          = {https://doi.org/10.1016/j.microrel.2012.12.011},
  doi          = {10.1016/J.MICROREL.2012.12.011},
  timestamp    = {Mon, 17 Aug 2020 16:24:01 +0200},
  biburl       = {https://dblp.org/rec/journals/mr/TomitaKYMUTFMI13.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}