BibTeX
@article{DBLP:journals/mr/RoyTKC05,
author = {Arijit Roy and
Cher Ming Tan and
Rakesh Kumar and
Xian Tong Chen},
title = {Effect of test condition and stress free temperature on
the electromigration failure of Cu dual damascene submicron
interconnect line-via test structures},
journal = {Microelectronics Reliability},
volume = {45},
number = {9-11},
year = {2005},
pages = {1443-1448},
ee = {http://dx.doi.org/10.1016/j.microrel.2005.07.042},
bibsource = {DBLP, http://dblp.uni-trier.de}
}
Copyright © 2007-03-27 by Michael Ley (ley@uni-trier.de)