<?xml version="1.0"?>
<dblp>
<article key="journals/mr/LiuZLKESH10" mdate="2010-09-29">
<author>Jie Liu</author>
<author>Jicheng Zhou</author>
<author>Hongwei Luo</author>
<author>Xuedong Kong</author>
<author>Yunfei En</author>
<author>Qian Shi</author>
<author>Yujuan He</author>
<title>Total-dose-induced edge effect in SOI NMOS transistors with different layouts.</title>
<pages>45-47</pages>
<year>2010</year>
<volume>50</volume>
<journal>Microelectronics Reliability</journal>
<number>1</number>
<ee>http://dx.doi.org/10.1016/j.microrel.2009.09.003</ee>
<url>db/journals/mr/mr50.html#LiuZLKESH10</url>
</article>
</dblp>
