<?xml version="1.0"?>
<dblp>
<article key="journals/mr/KrammerMJS12" mdate="2012-01-16">
<author>Oliv&#233;r Krammer</author>
<author>L&#225;szl&#243; Mil&#225;n Moln&#225;r</author>
<author>L&#225;szl&#243; Jakab</author>
<author>Andr&#225;s Szab&#243;</author>
<title>Modelling the effect of uneven PWB surface on stencil bending during stencil printing process.</title>
<pages>235-240</pages>
<year>2012</year>
<volume>52</volume>
<journal>Microelectronics Reliability</journal>
<number>1</number>
<ee>http://dx.doi.org/10.1016/j.microrel.2011.08.012</ee>
<url>db/journals/mr/mr52.html#KrammerMJS12</url>
</article>
</dblp>
