<?xml version="1.0"?>
<dblp>
<article key="journals/mj/ZhangMJXJLS07" mdate="2008-01-25">
<author>Tiemin Zhang</author>
<author>Guoqing Miao</author>
<author>Yixin Jin</author>
<author>Jianchun Xie</author>
<author>Hong Jiang</author>
<author>Zhiming Li</author>
<author>Hang Song</author>
<title>Effect of In content of the buffer layer on crystalline quality and electrical property of In<sub>0.82</sub>Ga<sub>0.18</sub>As/InP grown by LP-MOCVD.</title>
<pages>398-400</pages>
<year>2007</year>
<volume>38</volume>
<journal>Microelectronics Journal</journal>
<number>3</number>
<ee>http://dx.doi.org/10.1016/j.mejo.2007.01.015</ee>
<url>db/journals/mj/mj38.html#ZhangMJXJLS07</url>
</article>
</dblp>
