BibTeX record: journals/mj/TsangLKSLWLTE04

download as .bib file

@article{DBLP:journals/mj/TsangLKSLWLTE04,
  author    = {C. F. Tsang and
               C. Y. Li and
               A. Krishnamoorthy and
               Y. J. Su and
               H. Y. Li and
               L. Y. Wong and
               W. H. Li and
               L. J. Tang and
               K. Y. Ee},
  title     = {Impact of barrier deposition process on electrical and reliability
               performance of Cu/CVD low k SiOCH metallization},
  journal   = {Microelectronics Journal},
  volume    = {35},
  number    = {9},
  pages     = {693--700},
  year      = {2004},
  url       = {http://dx.doi.org/10.1016/j.mejo.2004.06.019},
  doi       = {10.1016/j.mejo.2004.06.019},
  timestamp = {Wed, 28 Mar 2007 12:55:39 +0200},
  biburl    = {http://dblp.uni-trier.de/rec/bib/journals/mj/TsangLKSLWLTE04},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}