BibTeX record: journals/mj/TsangLKSLWLTE04

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@article{DBLP:journals/mj/TsangLKSLWLTE04,
  author    = {C. F. Tsang and
               C. Y. Li and
               A. Krishnamoorthy and
               Y. J. Su and
               H. Y. Li and
               L. Y. Wong and
               W. H. Li and
               L. J. Tang and
               K. Y. Ee},
  title     = {Impact of barrier deposition process on electrical and reliability
               performance of Cu/CVD low k SiOCH metallization},
  journal   = {Microelectronics Journal},
  year      = {2004},
  volume    = {35},
  number    = {9},
  pages     = {693--700},
  url       = {http://dx.doi.org/10.1016/j.mejo.2004.06.019},
  doi       = {10.1016/j.mejo.2004.06.019},
  timestamp = {Tue, 21 Oct 2014 02:53:24 +0200},
  biburl    = {http://dblp.uni-trier.de/rec/bib/journals/mj/TsangLKSLWLTE04},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}