BibTeX record: journals/mj/TsangLKSLWLTE04

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@article{DBLP:journals/mj/TsangLKSLWLTE04,
  author    = {C. F. Tsang and
               C. Y. Li and
               A. Krishnamoorthy and
               Y. J. Su and
               H. Y. Li and
               L. Y. Wong and
               W. H. Li and
               L. J. Tang and
               K. Y. Ee},
  title     = {Impact of barrier deposition process on electrical and reliability
               performance of Cu/CVD low k SiOCH metallization},
  journal   = {Microelectronics Journal},
  year      = {2004},
  volume    = {35},
  number    = {9},
  pages     = {693--700},
  url       = {http://dx.doi.org/10.1016/j.mejo.2004.06.019},
  doi       = {10.1016/j.mejo.2004.06.019},
  timestamp = {Mon, 15 Sep 2014 04:04:07 +0200},
  biburl    = {http://dblp.uni-trier.de/rec/bib/journals/mj/TsangLKSLWLTE04},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}