BibTeX record journals/mj/TsangLKSLWLTE04

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@article{DBLP:journals/mj/TsangLKSLWLTE04,
  author    = {C. F. Tsang and
               C. Y. Li and
               A. Krishnamoorthy and
               Y. J. Su and
               H. Y. Li and
               L. Y. Wong and
               W. H. Li and
               L. J. Tang and
               K. Y. Ee},
  title     = {Impact of barrier deposition process on electrical and reliability
               performance of Cu/CVD low k SiOCH metallization},
  journal   = {Microelectronics Journal},
  volume    = {35},
  number    = {9},
  pages     = {693--700},
  year      = {2004},
  url       = {http://dx.doi.org/10.1016/j.mejo.2004.06.019},
  doi       = {10.1016/j.mejo.2004.06.019},
  timestamp = {Sat, 16 Aug 4434324 10:46:56 +},
  biburl    = {http://dblp.uni-trier.de/rec/bib/journals/mj/TsangLKSLWLTE04},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}