BibTeX record journals/ieicetc/OhmiIHK20

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@article{DBLP:journals/ieicetc/OhmiIHK20,
  author       = {Shun'ichiro Ohmi and
                  Shin Ishimatsu and
                  Yuske Horiuchi and
                  Sohya Kudoh},
  title        = {\emph{In-Situ} N\({}_{\mbox{2}}\)-Plasma Nitridation for High-k HfN
                  Gate Insulator Formed by Electron Cyclotron Resonance Plasma Sputtering},
  journal      = {{IEICE} Trans. Electron.},
  volume       = {103-C},
  number       = {6},
  pages        = {299--303},
  year         = {2020},
  url          = {https://doi.org/10.1587/transele.2019FUP0001},
  doi          = {10.1587/TRANSELE.2019FUP0001},
  timestamp    = {Mon, 18 Jan 2021 15:07:34 +0100},
  biburl       = {https://dblp.org/rec/journals/ieicetc/OhmiIHK20.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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