BibTeX record: journals/ibmrd/MedeirosAGHKMMMPA01

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@article{DBLP:journals/ibmrd/MedeirosAGHKMMMPA01,
  author    = {David R. Medeiros and
               Ari Aviram and
               C. Richard Guarnieri and
               {Wu-Song} Huang and
               Ranee Kwong and
               Christopher K. Magg and
               Arpan P. Mahorowala and
               Wayne M. Moreau and
               Karen E. Petrillo and
               Marie Angelopoulos},
  title     = {Recent progress in electron-beam resists for advaced mask-making.},
  journal   = {{IBM} Journal of Research and Development},
  year      = {2001},
  volume    = {45},
  number    = {5},
  pages     = {639--650},
  url       = {http://dx.doi.org/10.1147/rd.455.0639},
  doi       = {10.1147/rd.455.0639},
  timestamp = {Tue, 02 Sep 2014 23:57:14 +0200},
  biburl    = {http://dblp.uni-trier.de/rec/bib/journals/ibmrd/MedeirosAGHKMMMPA01},
  bibsource = {dblp computer science bibliography, http://dblp.org}
}