DBLP BibTeX Record 'journals/ibmrd/MedeirosAGHKMMMPA01'

  author    = {David R. Medeiros and
               Ari Aviram and
               C. Richard Guarnieri and
               Wu-Song Huang and
               Ranee Kwong and
               Christopher K. Magg and
               Arpan P. Mahorowala and
               Wayne M. Moreau and
               Karen E. Petrillo and
               Marie Angelopoulos},
  title     = {Recent progress in electron-beam resists for advaced mask-making},
  journal   = {IBM Journal of Research and Development},
  volume    = {45},
  number    = {5},
  year      = {2001},
  pages     = {639-650},
  ee        = {http://dx.doi.org/10.1147/rd.455.0639},
  bibsource = {DBLP, http://dblp.uni-trier.de}