@article{DBLP:journals/ibmrd/LicataCHL95,
author = {Thomas J. Licata and
Evan G. Colgan and
James M. E. Harper and
Stephen E. Luce},
title = {Interconnect fabrication processes and the development of
low-cost wiring for CMOS products},
journal = {IBM Journal of Research and Development},
volume = {39},
number = {4},
year = {1995},
pages = {419-436},
ee = {http://dx.doi.org/10.1147/rd.394.0419},
bibsource = {DBLP, http://dblp.uni-trier.de}
}