<?xml version="1.0"?>
<dblp>
<article key="journals/ibmrd/HeynsBCGDGKKLMMMNSTVVW99" mdate="2008-08-13">
<author>Marc M. Heyns</author>
<author>Twan Bearda</author>
<author>Ingrid Cornelissen</author>
<author>Stefan De Gendt</author>
<author>Robin Degraeve</author>
<author>Guido Groeseneken</author>
<author>Conny Kenens</author>
<author>D. Martin Knotter</author>
<author>Lee M. Loewenstein</author>
<author>Paul W. Mertens</author>
<author>Sofie Mertens</author>
<author>Marc Meuris</author>
<author>Tanya Nigam</author>
<author>Marc Schaekers</author>
<author>Ivo Teerlinck</author>
<author>Wilfried Vandervorst</author>
<author>Rita Vos</author>
<author>Klaus Wolke</author>
<title>Cost-effective cleaning and high-quality thin gate oxides.</title>
<pages>339-350</pages>
<year>1999</year>
<volume>43</volume>
<journal>IBM Journal of Research and Development</journal>
<number>3</number>
<ee>http://dx.doi.org/10.1147/rd.433.0339</ee>
<url>db/journals/ibmrd/ibmrd43.html#HeynsBCGDGKKLMMMNSTVVW99</url>
</article>
</dblp>
