<?xml version="1.0"?>
<dblp>
<article key="journals/ibmrd/CampbellKGHMG99" mdate="2008-08-13">
<author>Stephen A. Campbell</author>
<author>Hyeon-Seag Kim</author>
<author>David C. Gilmer</author>
<author>Boyong He</author>
<author>Tiezhong Ma</author>
<author>Wayne L. Gladfelter</author>
<title>Titanium dioxide (TiO2)-based gate insulators.</title>
<pages>383-392</pages>
<year>1999</year>
<volume>43</volume>
<journal>IBM Journal of Research and Development</journal>
<number>3</number>
<ee>http://dx.doi.org/10.1147/rd.433.0383</ee>
<url>db/journals/ibmrd/ibmrd43.html#CampbellKGHMG99</url>
</article>
</dblp>
