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BibTeX record journals/eswa/LinHLWWL09
@article{DBLP:journals/eswa/LinHLWWL09, author = {Chern{-}Sheng Lin and Kuo{-}Hon Huang and Yun{-}Long Lay and Kuo{-}Chun Wu and Yieng{-}Chiang Wu and Jim{-}Min Lin}, title = {An improved pattern match method with flexible mask for automatic inspection in the {LCD} manufacturing process}, journal = {Expert Syst. Appl.}, volume = {36}, number = {2}, pages = {3234--3239}, year = {2009}, url = {https://doi.org/10.1016/j.eswa.2008.01.035}, doi = {10.1016/J.ESWA.2008.01.035}, timestamp = {Fri, 26 May 2017 22:54:15 +0200}, biburl = {https://dblp.org/rec/journals/eswa/LinHLWWL09.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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