BibTeX record journals/computer/NeisserOLCMMWL24

download as .bib file

@article{DBLP:journals/computer/NeisserOLCMMWL24,
  author       = {Mark O. Neisser and
                  Ndubuisi G. Orji and
                  Harry J. Levinson and
                  Umberto Celano and
                  James R. Moyne and
                  Supika Mashiro and
                  Dan Wilcox and
                  Slava Libman},
  title        = {How Lithography and Metrology Are Enabling Yield in the Next Generation
                  of Semiconductor Patterning},
  journal      = {Computer},
  volume       = {57},
  number       = {1},
  pages        = {51--58},
  year         = {2024},
  url          = {https://doi.org/10.1109/MC.2023.3312767},
  doi          = {10.1109/MC.2023.3312767},
  timestamp    = {Wed, 10 Apr 2024 10:19:07 +0200},
  biburl       = {https://dblp.org/rec/journals/computer/NeisserOLCMMWL24.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
a service of  Schloss Dagstuhl - Leibniz Center for Informatics

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.