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BibTeX record journals/computer/NeisserOLCMMWL24
@article{DBLP:journals/computer/NeisserOLCMMWL24, author = {Mark O. Neisser and Ndubuisi G. Orji and Harry J. Levinson and Umberto Celano and James R. Moyne and Supika Mashiro and Dan Wilcox and Slava Libman}, title = {How Lithography and Metrology Are Enabling Yield in the Next Generation of Semiconductor Patterning}, journal = {Computer}, volume = {57}, number = {1}, pages = {51--58}, year = {2024}, url = {https://doi.org/10.1109/MC.2023.3312767}, doi = {10.1109/MC.2023.3312767}, timestamp = {Wed, 10 Apr 2024 10:19:07 +0200}, biburl = {https://dblp.org/rec/journals/computer/NeisserOLCMMWL24.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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