BibTeX record journals/chinaf/Wu11

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@article{DBLP:journals/chinaf/Wu11,
  author       = {Banqiu Wu},
  title        = {Next-generation lithography for 22 and 16 nm technology nodes and
                  beyond},
  journal      = {Sci. China Inf. Sci.},
  volume       = {54},
  number       = {5},
  pages        = {959--979},
  year         = {2011},
  url          = {https://doi.org/10.1007/s11432-011-4227-6},
  doi          = {10.1007/S11432-011-4227-6},
  timestamp    = {Mon, 02 Mar 2020 16:30:12 +0100},
  biburl       = {https://dblp.org/rec/journals/chinaf/Wu11.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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