BibTeX record conf/vlsit/NogamiGSNPHSLPS22

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@inproceedings{DBLP:conf/vlsit/NogamiGSNPHSLPS22,
  author       = {Takeshi Nogami and
                  Oleg Gluschenkov and
                  Yasir Sulehria and
                  Son Nguyen and
                  Brown Peethala and
                  Huai Huang and
                  Hosadurga Shobha and
                  Nick Lanzillo and
                  Raghuveer Patlolla and
                  Devika Sil and
                  Andrew Simon and
                  Daniel Edelstein and
                  Nelson Felix and
                  Junjun Liu and
                  Toshiyuki Tabata and
                  Fulvio Mazzamuto and
                  Sebastien Halty and
                  Fabien Roz{\'{e}} and
                  Yasutoshi Okuno and
                  Akira Uedono},
  title        = {Advanced {BEOL} Materials, Processes, and Integration to Reduce Line
                  Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects},
  booktitle    = {{IEEE} Symposium on {VLSI} Technology and Circuits {(VLSI} Technology
                  and Circuits 2022), Honolulu, HI, USA, June 12-17, 2022},
  pages        = {423--424},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/VLSITechnologyandCir46769.2022.9830488},
  doi          = {10.1109/VLSITECHNOLOGYANDCIR46769.2022.9830488},
  timestamp    = {Sat, 30 Sep 2023 09:58:23 +0200},
  biburl       = {https://dblp.org/rec/conf/vlsit/NogamiGSNPHSLPS22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}