Interconnect and current density stress: an introduction to electromigration-aware design.

Jens Lienig Interconnect and current density stress: an introduction to electromigration-aware design. 81-88 2005 conf/slip/2005 SLIP http://doi.acm.org/10.1145/1053355.1053374 db/conf/slip/slip2005.html#Lienig05