BibTeX record conf/sas2/LeeCHLHC19

download as .bib file

@inproceedings{DBLP:conf/sas2/LeeCHLHC19,
  author       = {Chen{-}Ju Lee and
                  Liang{-}Chieh Chao and
                  Kuo{-}Cheng Huang and
                  Yu{-}Hsuan Lin and
                  Min{-}Wei Hung and
                  Chun{-}Han Chou},
  title        = {Two-Dimensional Irradiance Measurement System for Aligner Lithography},
  booktitle    = {{IEEE} Sensors Applications Symposium, {SAS} 2019, Sophia Antipolis,
                  France, March 11-13, 2019},
  pages        = {1--4},
  publisher    = {{IEEE}},
  year         = {2019},
  url          = {https://doi.org/10.1109/SAS.2019.8705974},
  doi          = {10.1109/SAS.2019.8705974},
  timestamp    = {Wed, 16 Oct 2019 14:14:52 +0200},
  biburl       = {https://dblp.org/rec/conf/sas2/LeeCHLHC19.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
a service of  Schloss Dagstuhl - Leibniz Center for Informatics

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.