Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication.

Matthias G. Hackenberg Wolfgang Joppich Slobodan Mijalkovic Parallel Simulation of Coupled Oxidation and Diffusion in VLSI Wafer-Fabrication. 211-215 1997 PARCO db/conf/parco/parco97.html#HackenbergJM97