BibTeX record conf/mlcad/KimmelLW20

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@inproceedings{DBLP:conf/mlcad/KimmelLW20,
  author       = {Richard Kimmel and
                  Tong Li and
                  David Winston},
  editor       = {Ulf Schlichtmann and
                  Raviv Gal and
                  Hussam Amrouch and
                  Hai (Helen) Li},
  title        = {An Enhanced Machine Learning Model for Adaptive Monte Carlo Yield
                  Analysis},
  booktitle    = {{MLCAD} '20: 2020 {ACM/IEEE} Workshop on Machine Learning for CAD,
                  Virtual Event, Iceland, November 16-20, 2020},
  pages        = {89--94},
  publisher    = {{ACM}},
  year         = {2020},
  url          = {https://doi.org/10.1145/3380446.3430635},
  doi          = {10.1145/3380446.3430635},
  timestamp    = {Mon, 03 May 2021 16:42:27 +0200},
  biburl       = {https://dblp.org/rec/conf/mlcad/KimmelLW20.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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