BibTeX record conf/isvlsi/LiuTWTJ0Y15

download as .bib file

@inproceedings{DBLP:conf/isvlsi/LiuTWTJ0Y15,
  author       = {Chuangwen Liu and
                  Peishan Tu and
                  Pangbo Wu and
                  Haomo Tang and
                  Yande Jiang and
                  Jian Kuang and
                  Evangeline F. Y. Young},
  title        = {An Effective Chemical Mechanical Polishing Filling Approach},
  booktitle    = {2015 {IEEE} Computer Society Annual Symposium on VLSI, {ISVLSI} 2015,
                  Montpellier, France, July 8-10, 2015},
  pages        = {44--49},
  publisher    = {{IEEE} Computer Society},
  year         = {2015},
  url          = {https://doi.org/10.1109/ISVLSI.2015.75},
  doi          = {10.1109/ISVLSI.2015.75},
  timestamp    = {Fri, 24 Mar 2023 00:02:42 +0100},
  biburl       = {https://dblp.org/rec/conf/isvlsi/LiuTWTJ0Y15.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
a service of  Schloss Dagstuhl - Leibniz Center for Informatics

manage site settings

To protect your privacy, all features that rely on external API calls from your browser are turned off by default. You need to opt-in for them to become active. All settings here will be stored as cookies with your web browser. For more information see our F.A.Q.