Investigation of the capacitance deviation due to metal-fills and the effective interconnect geometry modeling.

Won-Seok Lee Keun-Ho Lee Jin-Kyu Park Tae-Kyung Kim Young-Kwan Park Jeong-Taek Kong Investigation of the capacitance deviation due to metal-fills and the effective interconnect geometry modeling. 373-376 2003 conf/isqed/2003 ISQED http://doi.ieeecomputersociety.org/10.1109/ISQED.2003.1194761 db/conf/isqed/isqed2003.html#LeeLPKPK03