BibTeX record conf/irps/TeraoHKSW22

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@inproceedings{DBLP:conf/irps/TeraoHKSW22,
  author       = {Yutaka Terao and
                  Takuji Hosoi and
                  Takuma Kobayashi and
                  Takayoshi Shimura and
                  Heiji Watanabe},
  title        = {Characterization of Electron Traps in Gate Oxide of m-plane SiC {MOS}
                  Capacitors},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2022, Dallas,
                  TX, USA, March 27-31, 2022},
  pages        = {66--1},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/IRPS48227.2022.9764433},
  doi          = {10.1109/IRPS48227.2022.9764433},
  timestamp    = {Sat, 30 Sep 2023 09:49:39 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/TeraoHKSW22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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