BibTeX record conf/irps/GaoSESPL18

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@inproceedings{DBLP:conf/irps/GaoSESPL18,
  author       = {David Z. Gao and
                  Jack Strand and
                  Al{-}Moatasem El{-}Sayed and
                  Alexander L. Shluger and
                  Andrea Padovani and
                  Luca Larcher},
  title        = {Role of electron and hole trapping in the degradation and breakdown
                  of SiO2 and HfO2 films},
  booktitle    = {{IEEE} International Reliability Physics Symposium, {IRPS} 2018, Burlingame,
                  CA, USA, March 11-15, 2018},
  pages        = {5},
  publisher    = {{IEEE}},
  year         = {2018},
  url          = {https://doi.org/10.1109/IRPS.2018.8353602},
  doi          = {10.1109/IRPS.2018.8353602},
  timestamp    = {Sat, 30 Sep 2023 09:49:38 +0200},
  biburl       = {https://dblp.org/rec/conf/irps/GaoSESPL18.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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