BibTeX record conf/imw2/BreuilNRBABRbR22

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@inproceedings{DBLP:conf/imw2/BreuilNRBABRbR22,
  author       = {L. Breuil and
                  L. Nyns and
                  S. Rachidi and
                  K. Banerjee and
                  Antonio Arreghini and
                  J. Bastos and
                  S. Ramesh and
                  G. Van den Bosch and
                  Maarten Rosmeulen},
  title        = {High-K incorporated in a SiON tunnel layer for 3D {NAND} programming
                  voltage reduction},
  booktitle    = {{IEEE} International Memory Workshop, {IMW} 2022, Dresden, Germany,
                  May 15-18, 2022},
  pages        = {1--4},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/IMW52921.2022.9779307},
  doi          = {10.1109/IMW52921.2022.9779307},
  timestamp    = {Mon, 19 Jun 2023 16:17:08 +0200},
  biburl       = {https://dblp.org/rec/conf/imw2/BreuilNRBABRbR22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}