BibTeX record conf/ickii/YenHTLC22

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@inproceedings{DBLP:conf/ickii/YenHTLC22,
  author       = {Chih{-}Feng Yen and
                  Yu{-}Ya Huang and
                  Shen{-}Hao Tsao and
                  Shih{-}Hao Lin and
                  Chun{-}Hu Cheng},
  title        = {Influence of {Y2O3} Doped HfO2 High-k Films on Electrical Properties
                  of {MOS} and {MIM} Devices},
  booktitle    = {5th {IEEE} International Conference on Knowledge Innovation and Invention,
                  {ICKII} 2022, Hualien, Taiwan, July 22-24, 2022},
  pages        = {225--229},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/ICKII55100.2022.9983564},
  doi          = {10.1109/ICKII55100.2022.9983564},
  timestamp    = {Wed, 04 Jan 2023 16:48:28 +0100},
  biburl       = {https://dblp.org/rec/conf/ickii/YenHTLC22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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