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BibTeX record conf/icip/CookL95
@inproceedings{DBLP:conf/icip/CookL95, author = {B. D. Cook and Soo{-}Young Lee}, title = {Fast exposure simulation for large circuit patterns in electron beam lithography}, booktitle = {Proceedings 1995 International Conference on Image Processing, Washington, DC, USA, October 23-26, 1995}, pages = {442--445}, publisher = {{IEEE} Computer Society}, year = {1995}, url = {https://doi.org/10.1109/ICIP.1995.529741}, doi = {10.1109/ICIP.1995.529741}, timestamp = {Fri, 24 Mar 2023 00:03:08 +0100}, biburl = {https://dblp.org/rec/conf/icip/CookL95.bib}, bibsource = {dblp computer science bibliography, https://dblp.org} }
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