BibTeX record conf/icce-tw/JhangCH22

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@inproceedings{DBLP:conf/icce-tw/JhangCH22,
  author       = {Wun{-}Ciang Jhang and
                  Pin{-}Han Chen and
                  Chih{-}Chieh Hsu},
  title        = {Dependence of SiO2 Gate Leakage Current on Annealing Temperature of
                  Solution Processed Tin Oxide Semiconductor},
  booktitle    = {{IEEE} International Conference on Consumer Electronics - Taiwan,
                  {ICCE-TW} 2022, Taipei, Taiwan, July 6-8, 2022},
  pages        = {569--570},
  publisher    = {{IEEE}},
  year         = {2022},
  url          = {https://doi.org/10.1109/ICCE-Taiwan55306.2022.9869260},
  doi          = {10.1109/ICCE-TAIWAN55306.2022.9869260},
  timestamp    = {Fri, 09 Sep 2022 16:55:42 +0200},
  biburl       = {https://dblp.org/rec/conf/icce-tw/JhangCH22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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