BibTeX record conf/iccad/ZhaoYYCM0W22

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@inproceedings{DBLP:conf/iccad/ZhaoYYCM0W22,
  author       = {Wenqian Zhao and
                  Xufeng Yao and
                  Ziyang Yu and
                  Guojin Chen and
                  Yuzhe Ma and
                  Bei Yu and
                  Martin D. F. Wong},
  editor       = {Tulika Mitra and
                  Evangeline F. Y. Young and
                  Jinjun Xiong},
  title        = {AdaOPC: {A} Self-Adaptive Mask Optimization Framework for Real Design
                  Patterns},
  booktitle    = {Proceedings of the 41st {IEEE/ACM} International Conference on Computer-Aided
                  Design, {ICCAD} 2022, San Diego, California, USA, 30 October 2022
                  - 3 November 2022},
  pages        = {123:1--123:9},
  publisher    = {{ACM}},
  year         = {2022},
  url          = {https://doi.org/10.1145/3508352.3549468},
  doi          = {10.1145/3508352.3549468},
  timestamp    = {Tue, 06 Jun 2023 10:37:26 +0200},
  biburl       = {https://dblp.org/rec/conf/iccad/ZhaoYYCM0W22.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}