@inproceedings{DBLP:conf/iccad/TianYTW02,
  author    = {Ruiqi Tian and
               Ronggang Yu and
               Xiaoping Tang and
               D. F. Wong},
  title     = {On mask layout partitioning for electron projection lithography},
  booktitle = {ICCAD},
  year      = {2002},
  pages     = {514-518},
  ee        = {http://doi.acm.org/10.1145/774572.774648},
  crossref  = {DBLP:conf/iccad/2002},
  bibsource = {DBLP, http://dblp.uni-trier.de}
}

@proceedings{DBLP:conf/iccad/2002,
  editor    = {Lawrence T. Pileggi and
               Andreas Kuehlmann},
  title     = {Proceedings of the 2002 IEEE/ACM International Conference
               on Computer-aided Design, 2002, San Jose, California, USA,
               November 10-14, 2002},
  booktitle = {ICCAD},
  publisher = {ACM},
  year      = {2002},
  isbn      = {0-7803-7607-2},
  bibsource = {DBLP, http://dblp.uni-trier.de}
}