Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance in nanometer technologies.

Xiaoning Qi Alex Gyure Yansheng Luo Sam C. Lo Mahmoud Shahram Kishore Singhal Measurement and characterization of pattern dependent process variations of interconnect resistance, capacitance and inductance in nanometer technologies. 14-18 2006 conf/glvlsi/2006 ACM Great Lakes Symposium on VLSI http://doi.acm.org/10.1145/1127908.1127914 db/conf/glvlsi/glvlsi2006.html#QiGLLSS06