Impact of dummy filling techniques on interconnect capacitance and planarization in nano-scale process technology.

Arthur Nieuwoudt Jamil Kawa Yehia Massoud Impact of dummy filling techniques on interconnect capacitance and planarization in nano-scale process technology. 151-154 2008 ACM Great Lakes Symposium on VLSI http://doi.acm.org/10.1145/1366110.1366148 conf/glvlsi/2008 db/conf/glvlsi/glvlsi2008.html#NieuwoudtKM08