BibTeX record conf/essderc/ScherublSCSS19

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@inproceedings{DBLP:conf/essderc/ScherublSCSS19,
  author       = {Thomas Scher{\"{u}}bl and
                  Yael Sufrin and
                  Avi Cohen and
                  Ofir Sharoni and
                  Rolf Seltmann},
  title        = {Excursion prevention and increasing device performance using mask
                  correction for intrafield {CD} and Overlay improvement},
  booktitle    = {49th European Solid-State Device Research Conference, {ESSDERC} 2019,
                  Cracow, Poland, September 23-26, 2019},
  pages        = {57--60},
  publisher    = {{IEEE}},
  year         = {2019},
  url          = {https://doi.org/10.1109/ESSDERC.2019.8901766},
  doi          = {10.1109/ESSDERC.2019.8901766},
  timestamp    = {Thu, 28 Nov 2019 11:19:20 +0100},
  biburl       = {https://dblp.org/rec/conf/essderc/ScherublSCSS19.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}