On the Topography Simulation of Memory Cell Trenches for Semiconductor Manufacturing Deposition Processes using the Level Set Method.

Clemens Heitzinger Siegfried Selberherr On the Topography Simulation of Memory Cell Trenches for Semiconductor Manufacturing Deposition Processes using the Level Set Method. 653-660 2002 conf/esm/2002 ESM db/conf/esm/esm2002.html#HeitzingerS02