BibTeX record conf/eics/KoschKH019

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@inproceedings{DBLP:conf/eics/KoschKH019,
  author       = {Thomas Kosch and
                  Jakob Karolus and
                  Havy Ha and
                  Albrecht Schmidt},
  editor       = {Jos{\'{e}} Ignacio Panach and
                  Jean Vanderdonckt and
                  Oscar Pastor},
  title        = {Your skin resists: exploring electrodermal activity as workload indicator
                  during manual assembly},
  booktitle    = {Proceedings of the {ACM} {SIGCHI} Symposium on Engineering Interactive
                  Computing Systems, {EICS} 2019, Valencia, Spain, June 18-21, 2019},
  pages        = {8:1--8:5},
  publisher    = {{ACM}},
  year         = {2019},
  url          = {https://doi.org/10.1145/3319499.3328230},
  doi          = {10.1145/3319499.3328230},
  timestamp    = {Sat, 30 Sep 2023 09:39:47 +0200},
  biburl       = {https://dblp.org/rec/conf/eics/KoschKH019.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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