BibTeX record conf/cadgraphics/GengSYL13

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@inproceedings{DBLP:conf/cadgraphics/GengSYL13,
  author       = {Zhen Geng and
                  Zheng Shi and
                  Xiaolang Yan and
                  Kai{-}sheng Luo},
  title        = {A New Level-Set-Based Inverse Lithography Algorithm for Process Robustness
                  Improvement with Attenuated Phase Shift Mask},
  booktitle    = {2013 International Conference on Computer-Aided Design and Computer
                  Graphics, CAD/Graphics 2013, Guangzhou, China, November 16-18, 2013},
  pages        = {68--73},
  publisher    = {{IEEE}},
  year         = {2013},
  url          = {https://doi.org/10.1109/CADGraphics.2013.16},
  doi          = {10.1109/CADGRAPHICS.2013.16},
  timestamp    = {Fri, 28 Jul 2023 15:16:38 +0200},
  biburl       = {https://dblp.org/rec/conf/cadgraphics/GengSYL13.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}

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