BibTeX record conf/amcc/ZhaoR15

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@inproceedings{DBLP:conf/amcc/ZhaoR15,
  author       = {Xiayun Zhao and
                  David W. Rosen},
  title        = {Process modeling and advanced control methods for Exposure Controlled
                  Projection Lithography},
  booktitle    = {American Control Conference, {ACC} 2015, Chicago, IL, USA, July 1-3,
                  2015},
  pages        = {3643--3648},
  publisher    = {{IEEE}},
  year         = {2015},
  url          = {https://doi.org/10.1109/ACC.2015.7171896},
  doi          = {10.1109/ACC.2015.7171896},
  timestamp    = {Mon, 05 Feb 2024 20:28:25 +0100},
  biburl       = {https://dblp.org/rec/conf/amcc/ZhaoR15.bib},
  bibsource    = {dblp computer science bibliography, https://dblp.org}
}
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