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Xiaoyan Liu
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Publications
- 2023
- [j128]Pengying Chang, Mengqi Fan, Gang Du, Xiaoyan Liu, Yiyang Xie:
Intrinsic variations of ultrathin hafnium oxide-based ferroelectric tunnel junctions induced by ferroelectric-dielectric phase fluctuations. Sci. China Inf. Sci. 66(10) (2023) - 2022
- [j107]Liqiao Liu, Guihai Yu, Gang Du, Xiaoyan Liu:
A centripetal collection image sensor (CCIS) based on back gate modulation achieving 1T submicron pixel. Sci. China Inf. Sci. 65(4) (2022) - 2021
- [j87]Pengying Chang, Gang Du, Xiaoyan Liu:
Design space for stabilized negative capacitance in HfO2 ferroelectric-dielectric stacks based on phase field simulation. Sci. China Inf. Sci. 64(2) (2021) - [j86]Linlin Cai, Wangyong Chen, Jinfeng Kang, Gang Du, Xiaoyan Liu, Xing Zhang:
A physics-based electromigration reliability model for interconnects lifetime prediction. Sci. China Inf. Sci. 64(11) (2021) - 2019
- [j63]Kunliang Wang, Gang Du, Zhiyuan Lun, Wangyong Chen, Xiaoyan Liu:
Modeling of program Vth distribution for 3-D TLC NAND flash memory. Sci. China Inf. Sci. 62(4): 42401:1-42401:10 (2019) - [j62]Shaoyan Di, Lei Shen, Pengying Chang, Kai Zhao, Tiao Lu, Gang Du, Xiaoyan Liu:
Systematic calibration of drift diffusion model for InGaAs MOSFETs in quasi-ballistic regime. Sci. China Inf. Sci. 62(6): 62406:1-62406:8 (2019) - [c62]Xiaoyan Liu, Wangyong Chen, Linlin Cai, Gang Du, Xing Zhang:
Self-heating Induced Variability and Reliability in Advanced Logic Devices and Circuits. ASICON 2019: 1-4 - 2018
- [j55]Longxiang Yin, Lei Shen, Hai Jiang, Gang Du, Xiaoyan Liu:
Impact of self-heating effects on nanoscale Ge p-channel FinFETs with Si substrate. Sci. China Inf. Sci. 61(6): 062401:1-062401:9 (2018) - [j54]Lei Shen, Shaoyan Di, Longxiang Yin, Xiaoyan Liu, Gang Du:
Calibration of drift-diffusion model in quasi-ballistic transport region for FinFETs. Sci. China Inf. Sci. 61(6): 062406:1-062406:8 (2018) - [c56]Yun Li, K. L. Wang, Shaoyan Di, Peng Huang, Gang Du, Xiao-Yan Liu:
PBTI evaluation of In0.65Ga0.35As/In0.53Ga0.47As nanowire FETs with Al2O3 and LaAlO3 gate dielectrics. IRPS 2018: 7-1 - 2016
- [j37]Zhiyuan Lun, Gang Du, Kai Zhao, Xiaoyan Liu, Yi Wang:
A two-dimensional simulation method for investigating charge transport behavior in 3-D charge trapping memory. Sci. China Inf. Sci. 59(12): 122403:1-122403:10 (2016) - 2015
- [c39]Hai Jiang, Longxiang Yin, Yun Li, Nuo Xu, Kai Zhao, Yandong He, Gang Du, Xiaoyan Liu, Xing Zhang:
Comprehensive understanding of hot carrier degradation in multiple-fin SOI FinFETs. IRPS 2015: 6 - 2014
- [j27]Kangliang Wei, James Egley, Xiaoyan Liu, Gang Du:
Remote charge scattering: a full Coulomb interaction approach and its impact on silicon nMOS FinFETs with HfO2 gate dielectric. Sci. China Inf. Sci. 57(2): 1-9 (2014) - [c35]Pengying Chang, Lang Zeng, Xiaoyan Liu, Gang Du:
Hole mobility in InSb-based devices: Dependency on surface orientation, body thickness and strain. ESSDERC 2014: 122-125 - 2013
- [j17]Shufang Zhu, Kangliang Wei, Gang Du, Xiaoyan Liu:
3D Monte Carlo Simulation of gate-All-around germanium nMOSFET with Effective potential Quantum Correction. J. Circuits Syst. Comput. 22(10) (2013) - 2011
- [j13]Gang Du, Xiaoyan Liu, Ruqi Han:
High frequency performance of nano-scale ultra-thin-body Schottky-barrier n-MOSFETs. Sci. China Inf. Sci. 54(8): 1756-1761 (2011)
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