| 2011 | ||
|---|---|---|
| j1 | Ru Huang, Runsheng Wang, Changze Liu, Liangliang Zhang, Jing Zhuge, Yu Tao, Jinbin Zou, Yuchao Liu, Yangyuan Wang: HCI and NBTI induced degradation in gate-all-around silicon nanowire transistors. Microelectronics Reliability 51(9-11): 1515-1520 (2011) | |
| c1 | Ru Huang, Runsheng Wang, Jing Zhuge, Changze Liu, Tao Yu, Liangliang Zhang, Xin Huang, Yujie Ai, Jinbin Zou, Yuchao Liu, Jiewen Fan, Huailin Liao, Yangyuan Wang: Characterization and analysis of gate-all-around Si nanowire transistors for extreme scaling. CICC 2011: 1-8 | |
| 1 | Yujie Ai | |
| 2 | Jiewen Fan | |
| 3 | Ru Huang | |
| 4 | Xin Huang | |
| 5 | Huailin Liao | |
| 6 | Changze Liu | |
| 7 | Yuchao Liu | |
| 8 | Yu Tao | |
| 9 | Runsheng Wang | |
| 10 | Yangyuan Wang | |
| 11 | Tao Yu | |
| 12 | Liangliang Zhang | |
| 13 | Jing Zhuge |
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