Lars Liebmann

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta: Layout Decomposition and Legalization for Double-Patterning Technology. IEEE Trans. on CAD of Integrated Circuits and Systems 32(2): 202-215 (2013)

Rani S. Ghaida, Kanak B. Agarwal, Sani R. Nassif, Xin Yuan, Lars Liebmann, Puneet Gupta: A framework for double patterning-enabled design. ICCAD 2011: 14-20

Shayak Banerjee, Kanak B. Agarwal, Sani R. Nassif, James A. Culp, Lars Liebmann, Michael Orshansky: Coupling timing objectives with optical proximity correction for improved timing yield. ISQED 2011: 97-102

Tejas Jhaveri, Vyacheslav Rovner, Lars Liebmann, Larry T. Pileggi, Andrzej J. Strojwas, Jason Hibbeler: Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings. IEEE Trans. on CAD of Integrated Circuits and Systems 29(4): 509-527 (2010)

Shayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky: Electrically driven optical proximity correction based on linear programming. ICCAD 2008: 473-479

Louis Scheffer, Lars Liebmann, Riko Rakojcic, David White: Rules vs tools: what's the right way to address IC manufacturing complexity? ISPD 2007: 75-76

Lars Liebmann: Layout impact of resolution enhancement techniques: impediment or opportunity? ISPD 2003: 110-117

Mark A. Lavin, Lars Liebmann: CAD computation for manufacturability: can we save VLSI technology from itself? ICCAD 2002: 424-431

Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001)

Lars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur: Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. DAC 2001: 79-84

Fook-Luen Heng, Lars Liebmann, Jennifer Lund: Application of automated design migration to alternating phase shift mask design. ISPD 2001: 38-43