Martin Bednarzik

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	2003
c2		Linke Jian, Bernd Loechel, Heinz-Ulrich Scheunemann, Martin Bednarzik, Yohannes M. Desta, Jost Goettert: Fabrication of Ultra Thick, Ultra High Aspect Ratio Microcomponents by Deep and Ultra Deep X-Ray Lithography. ICMENS 2003: 10-14
c1		Martin Bednarzik, Heinz-Ulrich Scheunemann, Alexander Barth, Daniel Schondelmaier, Bernd Loechel: First Results in Patterning of Ultra High Aspect Ratio Microstructures by a 4T Wave Length Shifter at BESSY. ICMENS 2003: 177-

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