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IBM Journal of Research and Development, Volume 37, 1993
Volume 37, Number 1, 1993
- Hiroyuki Ono:

Architecture and performance of the ESPER-2 hard-disk drive servo writer. 3-11 - James E. Phillips, Stamatis Vassiliadis:

Proof of correctness of high-performance 3-1 interlock collapsing ALUs. 12-21 - Alina Deutsch, David W. Dranchak, G. Arjavalingam, Christopher W. Surovic, James K. Tam, Gerard V. Kopcsay, John B. Gillett:

Electrical characterization and performance limits of a flexible cable. 22-38
Volume 37, Number 2, 1993
- Jean Horkans:

Preface. 83-84 - Hariklia Deligianni, Lubomyr T. Romankiw:

In situ surface pH measurement during electrolysis using a rotating pH electrode. 85-96 - Jean Horkans, I-Chia Hsu Chang, Panayotis C. Andricacos:

A rotating ring-disk stripping technique used to study electroplating of Sn-Pb from methane sulfonic acid solutions. 97-106 - John G. Gaudiello, Gerald L. Ballard:

Mechanistic insights into metal-mediated electroless copper plating employing hypophosphite as a reducing agent. 107-116 - Rangarajan Jagannathan, Mahadevaiyer Krishnan:

Electroless plating of copper at a low pH level. 117-124 - John O. Dukovic:

Feature-scale simulation of resist-patterned electrodeposition. 125-142 - Oscar A. Moreno, Robert H. Katyl, Jeffrey D. Jones, Peter A. Moschak:

Mass transfer of an impinging jet confined between parallel plates. 143-156 - Kay Keij Kanazawa, Owen R. Melroy:

The quartz resonator: Electrochemical applications. 157-172 - Vlasta Brusic, Gerald S. Frankel, Chao-Kyn Hu, Miro M. Plechaty, Geraldine Cogin Schwartz:

Corrosion and protection of thin-line conductors in VLSI structures. 173-190 - Alejandro G. Schrott, Gerald S. Frankel:

Application of X-ray spectroscopy to the study of electrochemically formed surface oxide films. 191-206 - Madhav Datta:

Anodic dissolution of metals at high rates. 207-226 - Hajime Seki:

In situ infrared spectroscopy of the electrode - electrolyte interface. 227-242 - James R. White:

Conduction mechanisms in contaminant layers on printed circuit boards. 243-248 - Arthur F. Diaz, Jean Guay:

Contact charging of organic materials: Ion vs. electron transfer. 249-260
Volume 37, Number 3, 1993
- John M. Warlaumont:

Preface. 288-290 - Eberhard Spiller:

Early history of X-ray lithography at IBM. 291-298 - Alan D. Wilson:

X-ray lithography in IBM, 1980-1992, the development years. 299-318 - Henry I. Smith, Mark L. Schattenburg:

X-ray lithography from 500 to 30 nm: X-ray nanolithography. 319-330 - Jerry Z. Y. Guo, Franco Cerrina:

Modeling X-ray proximity lithography. 331-350 - Martin N. Wilson, Ailstair I. C. Smith, V. C. Kempson, Martin C. Townsend, Joseph C. Schouten, Robert J. Anderson, A. R. Jorden, Victor P. Suller, Michael W. Poole:

The Helios 1 compact superconducting storage ring X-ray source. 351-372 - Chas Archie:

Performance of the IBM synchrotron X-ray source for lithography. 373-384 - Jeffrey A. Leavey, L. Grant Lesoine:

Design considerations for the IBM X-ray lithography facility. 385-394 - Jerome P. Silverman, Robert P. Rippstein, James M. Oberschmidt:

X-ray lithography beamlines in the IBM Advanced Lithography Facility. 395-410 - Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Denise Puisto, Donald K. Bailey:

Electron beam lithography tool for manufacture of X-ray masks. 411-420 - Patricia G. Blauner, John Mauer:

X-ray mask repair. 421-434 - David Seeger:

Resist materials and processes for X-ray lithography. 435-448
Volume 37, Number 4, 1993
- Dennis P. Fazzio, Michael A. Moser, Christopher J. Polson, John N. Scheffel:

Head actuator dynamics of an IBM 5 1/4-inch disk drive. 479-490 - Brock E. Osborn:

Statistical modeling in manufacturing: Adapting a diagnostic tool to real-time applications. 491-506 - Beth Tibbitts:

Flexible simulation of a complex semiconductor manufacturing line using a rule-based system. 507-522 - Stephen J. Grotzinger, Rarnesh Srinivasan, Ramakrishna Akella, Srinivas Bollapragada:

Component procurement and allocation for products assembled to forecast: Risk-pooling effects. 523-536 - David R. Irvin:

Modeling the cost of data communication for multi-node computer networks operating in the United States. 537-546 - Richard J. Eickemeyer, Stamatis Vassiliadis:

A load-instruction unit for pipelined processors. 547-564
Volume 37, Number 5, 1993
- Chun K. Lim, Thomas Caulfield, Joseph Benenati:

Preface. 582-584 - John S. Corbin:

Finite element analysis for Solder Ball Connect (SBC) structural design optimization. 585-596 - Michael D. Ries, Donald R. Banks, David P. Watson, Karl G. Hoebener:

Attachment of Solder Ball Connect (SBC) packages to circuit cards. 597-608 - H. Victor Mahaney:

Thermal modeling of the infrared reflow process for Solder Ball Connect (SBC). 609-620 - Tien Y. Wu, Yifan Guo, William T. Chen:

Thermal-mechanical strain characterization for printed wiring boards. 621-634 - Yifan Guo, Chun K. Lim, William T. Chen, Charles G. Woychik:

Solder Ball Connect (SBC) assemblies under thermal loading: I. Deformation measurement via moiré interferometry, and its interpretation. 635-648 - Hyung-Chu Choi, Yifan Guo, William LaFontaine, Chun K. Lim:

Solder Ball Connect (SBC) assemblies under thermal loading: II. Strain analysis via image processing, and reliability considerations. 649-660
Volume 37, Number 6, 1993
- Peter S. Hauge:

Preface. 678

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