 | 2009 |
| 5 |  | Jinxing Wang,
Apurba Laha,
Andreas Fissel,
Dominik Schwendt,
Rytis Dargis,
Tatsuro Watahiki,
Roman Shayduk,
Wolfgang Braun,
Tianmo Liu,
H. Jörg Osten:
Structural and strain relaxation study of epitaxially grown nano-thick Nd2O3/Si(111) heterostructure.
NEMS 2009: 436-440 |
| 4 |  | Apurba Laha,
E. Bugiel,
Rytis Dargis,
Dominik Schwendt,
M. Badylevich,
V. V. Afanasev,
A. Stesmans,
Andreas Fissel,
H. Jörg Osten:
Integration of low dimensional crystalline Si into functional epitaxial oxides.
Microelectronics Journal 40(3): 633-637 (2009) |
| 2008 |
| 3 |  | Andreas Fissel,
Apurba Laha,
E. Bugiel,
D. Kühne,
M. Czernohorsky,
Rytis Dargis,
H. Jörg Osten:
Silicon in functional epitaxial oxides: A new group of nanostructures.
Microelectronics Journal 39(3-4): 512-517 (2008) |
| 2005 |
| 2 |  | Andreas Fissel,
C. Wang,
E. Bugiel,
H. Jörg Osten:
Epitaxial growth of non-cubic silicon.
Microelectronics Journal 36(3-6): 506-509 (2005) |
| 2001 |
| 1 |  | H. Jörg Osten,
J. P. Liu,
H.-J. Müssig,
P. Zaumseil:
Epitaxial, high-K dielectrics on silicon: the example of praseodymium oxide.
Microelectronics Reliability 41(7): 991-994 (2001) |